Objective Selector
Objective Comparison
CFI S Plan Fluor ELWD NAMC 20XC |
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Material Number | MRH68200 |
Type | Super Plan Fluor |
Primary Technique | Advanced Modulation Contrast |
Immersion | Air |
Magnification | 20X |
Numerical Aperture | 0.45 |
Working Distance | 8.2–6.9 |
Cover Glass Thickness | 0–2 |
CFI S Plan Fluor ELWD NAMC 20XC |
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Diagram (mm) |
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Transmittance Graph |
CFI S Plan Fluor ELWD NAMC 20XC |
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Brightfield | suitable |
Darkfield | |
DIC | |
Fluorescence (visible) | suitable |
Fluorescence (UV) | suitable |
Fluorescence (NIR) | |
Polarizing | |
Polarizing Type | |
Phase Contrast Ring | |
Phase Contrast Type |
CFI S Plan Fluor ELWD NAMC 20XC |
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---|---|
Correction Collar | ✓ |
Spring Loaded | |
Iris | |
Long Working Distance | ✓ |
Ti2-E PFS Compatible |
CFI S Plan Fluor ELWD NAMC 20XC |
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---|---|
Asbestos | |
Clear Tissue | |
Clinical / Laboratory | ✓ |
Confocal | |
Education | |
Laser Trapping / Tweezing | |
Multiphoton | |
SIM | |
STORM | |
Research | ✓ |
TIRF | |
Tissue Culture | ✓ |