Objective Selector

Objective Comparison

CFI S Plan Fluor
ELWD ADM 20XC
Material Number MRH48230
Type Super Plan Fluor
Primary Technique Apodized Phase Contrast
Immersion  
Magnification 20×
Numerical Aperture 0.45
Working Distance 8.20–6.90
Cover Glass Thickness 0.00–2.00
CFI S Plan Fluor
ELWD ADM 20XC
Brightfield suitable
Darkfield universal condenser (dry) and darkfield ring, darkfield condenser (dry/oil)
DIC  
Fluorescence (visible) suitable
Fluorescence (UV) suitable
Fluorescence (NIR)  
Polarizing  
Polarizing Type
Phase Contrast Ring ◎PH1
Phase Contrast Type ADM
CFI S Plan Fluor
ELWD ADM 20XC
Correction Collar
Spring Loaded
Iris  
Long Working Distance
Ti2-E PFS Compatible
CFI S Plan Fluor
ELWD ADM 20XC
Asbestos  
Clear Tissue  
Clinical / Laboratory  
Confocal  
Education  
Laser Trapping / Tweezing  
Multiphoton  
SIM  
STORM  
Research
TIRF  
Tissue Culture