News

Nikon Instruments, Inc., a world leader in the development of advanced optical technology for microscopy, today announced the Nikon ECLIPSE LV100DA episcopic/diascopic illumination microscope designed for material science applications.

The ECLIPSE LV100DA is a modular solution for material analysis and imaging solutions designed to keep pace with the higher performance demands in the semiconductor and medical device markets,

"The LV100DA can be custom configured for a variety of applications," said Mike Metzger, Nikon general manager, Industrial Department, Nikon Instruments. "The Eclipse LV series microscopes support a diverse set of imaging requirements from R&D and quality control to manufacturing process inspection."

Modular Versatility

The modular design of the ECLIPSE LV100DA provides superb performance when inspecting semiconductors, flat panel displays, packages, electronics substrates, materials, medical devices, and a variety of other samples. The unit provides easy access to controls and an integrated interface box. In addition, the LV100DA uses the new LV-S64 6x4 stage allowing the microscope to handle larger samples. The LV100DA includes a built in stage carrier and supports the LV-NU5AC motorized nosepiece that comes with a centering mechanism that minimizes image drift when the objectives are changed.

Extended Vision Capability

A wide variety of observation methods is available with the ECLIPSE LV100DA microscope including first order compensator, UV polarizing, and epi- fluorescence -- in addition to brightfield, darkfield, DIC and simple polarizing techniques.

The LV-UEPI2A motorized illuminator controls the illuminator changeover turret and aperture diaphragm so the diaphragm is automatically optimized according to the objective in use. Nikon's LV-LH50PC 12V-50W Lamphouse is a low power consumption halogen light source equivalent to a 12V-100W product and contributes to the compact design of the microscope.

Outstanding Optical Performance

Nikon objective lenses feature high NA, long working distances and extended wavelength transmission range. The new CFI Plan Fluor series covers transition wavelength ranges up to UV. These lenses are used for various research, analysis and examination procedures. Only one kind of objective lens is needed for brightfield, darkfield, and other observation techniques. These objectives offer high resolution and are easy to use, and can be combined not only with the LV series microscopes, but also with other Nikon equipment for even greater versatility. The CF160 series of Nikon objectives now includes the CFI L Plan EPI CR series of objective lenses designed to cope with the thin coverglass used in LCDs, and similar highly integrated, dense devices. Coverglass correction can be made from 0 mm up to 1.3mm with the correction ring. The series features 20X, 50x, and two correction ranges of 100x objective lenses (0.0- 0.7mm and 0.6-1.3mm). Each lens in the series offers high NA while enabling high contrast imaging of patterns free of distortion caused by the effects of a coverglass in the system.