대물렌즈 셀렉터

Objective Comparison

CFI S Plan Fluor
ELWD ADM 20XC
Material Number MRH48230
Type Super Plan Fluor
Primary Technique Apodized 위상 콘트라스트
Immersion Air
Magnification 20X
Numerical Aperture 0.45
Working Distance 8.2–6.9
Cover Glass Thickness 0–2
CFI S Plan Fluor
ELWD ADM 20XC
Diagram
(mm)
Transmittance Graph
CFI S Plan Fluor
ELWD ADM 20XC
Brightfield suitable
Darkfield universal condenser (dry) and darkfield ring, darkfield condenser (dry/oil)
DIC  
Fluorescence (visible) suitable
Fluorescence (UV) suitable
Fluorescence (NIR)  
Polarizing  
Polarizing Type
Phase Contrast Ring ◎PH1
Phase Contrast Type ADM
CFI S Plan Fluor
ELWD ADM 20XC
Correction Collar
Spring Loaded
Iris  
Long Working Distance
Ti2-E PFS Compatible
CFI S Plan Fluor
ELWD ADM 20XC
Asbestos  
Clear Tissue  
Clinical / Laboratory  
Confocal  
Education  
Laser Trapping / Tweezing  
Multiphoton  
SIM  
STORM  
Research
TIRF  
Tissue Culture